METHOD OF MANUFACTURING TRANSMISSION TYPE OPTICAL ELEMENT EXPOSURE APPARATUS METHOD OF MANUFACTURING ARTICLE AND TRANSMISSION TYPE OPTICAL ELEMENT

• Main Authors: SUDA HIROMI, TAKADA HIROKI
• Format: Patent
• Language: English; Korean
• Published: 04.01.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention relates to a method for manufacturing a light-transmitting optical element, including: a first process of forming an anti-reflective film on the surface of the optical element; and a second process of removing the anti-reflective film formed in the first process in the thickness direction of the anti-reflective film, wherein the anti-reflective film is removed in the thickness direction so that at least a part of the anti-reflective film can remain even in a region where the anti-reflective film is removed in the second process. 광투과형의 광학 소자를 제조하는 제조방법으로서, 상기 광학 소자의 표면에 반사 방지막을 형성하는 제1 공정과, 상기 제1 공정에서 형성된 상기 반사 방지막을, 상기 반사 방지막의 두께 방향으로 제거하는 제2 공정을 갖고, 상기 제2 공정에서는, 상기 반사 방지막이 제거되는 영역이라도, 상기 반사 방지막의 적어도 일부가 잔존하도록, 상기 반사 방지막을 상기 두께 방향으로 제거하는 것을 특징으로 하는 제조방법을 제공한다.