SUBSTRATE FIXING DEVICE ELECTROSTATIC CHUCK AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK

• Main Authors: TAKEMOTO KEIICHI, HARAYAMA YOICHI
• Format: Patent
• Language: English; Korean
• Published: 23.12.2021
• Subjects: BASIC ELECTRIC ELEMENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERATION; MACHINE TOOLS; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; TRANSPORTING

A substrate fixing device is provided. The substrate fixing device includes: a base plate; and an electrostatic chuck fixed to the base plate and configured to suck an object by electrostatic force. The electrostatic chuck includes: an adsorption layer configured to adsorb and hold the object; and a heater layer provided between the adsorption layer and the base plate and configured to heat the object held by the adsorption layer. The thickness of the heater layer is uniform over the entire area of the heater layer. 기판 고정 장치가 제공된다. 기판 고정 장치는 베이스 플레이트; 및 베이스 플레이트에 고정되고 정전기력에 의해 대상물을 흡착하도록 구성된 정전 척을 포함한다. 정전 척은, 대상물을 흡착 유지하도록 구성된 흡착층; 및 흡착층과 베이스 플레이트 사이에 마련되고 흡착층에 의해 유지된 대상물을 가열하도록 구성된 히터층을 포함한다. 히터층의 두께는 히터층의 전체 영역에 걸쳐 균일하다.