VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD

• Main Authors: RYU SUNG RYONG, KWON HYUNG DU, CHOI SEUNG HO, KIM KYUNG HAN, JUNG JONGH WAN, CHOI KYUNG OH
• Format: Patent
• Language: English; Korean
• Published: 07.12.2021
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The vapor deposition apparatus comprises: a carrier on which a substrate is mounted; a deposition chamber in which deposition process for depositing a deposition material on the substrate is performed; a second chamber in which the carrier, on which the substrate completed the deposition process mounts, is inserted; and a first chamber including a robot arm which separates the substrate completed the deposition process from the carrier in vacuum state and transfers the substrate from the second chamber. The second camber always maintains the vacuum state. The vapor deposition apparatus prevents the carrier from moisture absorption. 증착 장치는 기판이 안착되는 캐리어, 상기 기판에 증착 물질을 증착하는 증착 공정이 진행되는 증착 챔버, 상기 증착 공정이 완료된 기판이 안착된 상기 캐리어가 반입되는 제2 챔버, 및 진공 상태에서 상기 캐리어로부터 상기 증착 공정이 완료된 기판을 분리시켜서 상기 제2 챔버로부터 이송하는 로봇암을 포함하는 제1 챔버를 포함하고, 상기 제2 챔버는 항상 진공 상태를 유지한다.