GATE VALVE APPARATUS FOR PROCESS CHAMBER

The present embodiment relates to a gate valve device for a process chamber. In the present invention, a protrusion unit of a blade is inserted into the opening space of a process chamber gate unit to remove or separate the opening space from the process space, thereby solving the problem of having...

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Bibliographic Details
Main Authors JANG SANG LAE, YANG SUNG JAE, OH SANGYOUNG
Format Patent
LanguageEnglish
Korean
Published 20.10.2021
Subjects
ACTUATING-FLOATS
BASIC ELECTRIC ELEMENTS
BLASTING
COCKS
DEVICES FOR VENTING OR AERATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ENGINEERING ELEMENTS AND UNITS
GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS
HEATING
LIGHTING
MECHANICAL ENGINEERING
SEMICONDUCTOR DEVICES
TAPS
THERMAL INSULATION IN GENERAL
VALVES
WEAPONS
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Summary:The present embodiment relates to a gate valve device for a process chamber. In the present invention, a protrusion unit of a blade is inserted into the opening space of a process chamber gate unit to remove or separate the opening space from the process space, thereby solving the problem of having an asymmetry in the process space in the process chamber. 본 실시예는 공정챔버를 위한 게이트밸브장치에 관한 것으로서, 공정챔버 게이트부의 개구공간에 블레이드의 돌출부를 삽입시켜 공정공간에서 개구공간을 제거 혹은 분리시키고 이를 통해 공정챔버 내의 공정공간이 비대칭성을 갖는 문제를 해결한다.
Bibliography:Application Number: KR20200044384