IMPRINT APPARATUS IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD

Provided is an imprint apparatus capable of minimizing contamination in an apparatus by an uncured material and the like. The imprint apparatus comprises: a first irradiation unit configured to irradiate light to an imprint material to perform curing in a state that the imprint material on a substra...

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Bibliographic Details
Main Author ANDO TOSHIAKI
Format Patent
LanguageEnglish
Korean
Published 14.10.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Provided is an imprint apparatus capable of minimizing contamination in an apparatus by an uncured material and the like. The imprint apparatus comprises: a first irradiation unit configured to irradiate light to an imprint material to perform curing in a state that the imprint material on a substrate is in contact with a pattern unit having concave and convex patterns and formed in a mold; and a second irradiation unit configured to irradiate light to a peripheral area of the pattern unit of the mold after irradiating light using the first irradiation unit. 미경화 재료 등에 의한 장치 내의 오염을 최소화할 수 있는 임프린트 장치가 제공된다. 임프린트 장치는, 기판 상의 임프린트재가 몰드에 형성되어 있는 오목 및 볼록 패턴을 갖는 패턴부와 접촉하고 있는 상태에서 경화를 행하기 위해 임프린트재에 광을 조사하도록 구성되는 제1 조사 유닛; 및 제1 조사 유닛을 사용한 광의 조사 후에 몰드의 패턴부의 주변 영역에 광을 조사하도록 구성되는 제2 조사 유닛을 포함한다.
Bibliography:Application Number: KR20210039293