FLOATING STAGE AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME

• Main Authors: OH YOUNG KYU, GOO SE HUN, PARK GI HONG, LEE JUNG SOO, HONG CHUNG OH, HA MIN JEONG
• Format: Patent
• Language: English; Korean
• Published: 08.10.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

One object of the present invention is to provide a levitation stage having a pressure providing unit that is arranged to distribute a gas pressure and vacuum pressure for levitating a substrate. The levitation stage is for levitating the substrate transferred along a row direction. The levitation stage can be equipped with the pressure-providing unit for providing the gas pressure and vacuum pressure capable of levitating the substrate. The pressure providing unit can be equipped to be arranged in a curved line instead of a straight line in a column direction perpendicular to the row direction. 부상 스테이지는 행 방향을 따라 이송되는 기판을 부상시키기 위한 것으로써, 상기 부상 스테이지에는 상기 기판을 부상시킬 수 있는 가스압 및 진공압을 제공하는 압력 제공부가 구비될 수 있고, 상기 압력 제공부는 상기 행 방향과 수직하는 열 방향으로 직선이 아닌 곡선으로 나열되도록 구비될 수 있다.