OLED ORGANIC THIN-FILM METHOD OF MANUFACTURING ORGANIC THIN-FILM OLED DEVICE INCLUDING ORGANIC THIN-FILM AND SPUTTERING APPARATUS

• Main Authors: KOH, SUCK HOON, SO, MOON SOOK, LEE, DUK KI
• Format: Patent
• Language: English; Korean
• Published: 30.09.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to an organic thin film, a method of manufacturing an organic thin film, an OLED device including an organic thin film and a sputtering apparatus. A method of manufacturing an organic thin film using a sputtering apparatus in accordance with the present invention, comprises the steps of: disposing a target including a target material in a chamber of the sputtering apparatus and disposing a substrate, on which the target material is to be deposited, in the chamber to be spaced at a predetermined distance from the target; maintaining a vacuum inside the chamber and then injecting a sputtering gas; and applying, to the target, a predetermined power capable of generating plasma while a magnetic field of at least 1000 gausses is provided between the target and the substrate to form an organic thin film on the substrate for maintaining the temperature of the target material at 200℃ or less during deposition, thereby avoiding damage to the characteristics of the organic material. 본 발명은 유기 박막, 유기 박막의 제조방법, 유기 박막을 포함하는 OLED 디바이스 및 스퍼터링 장치에 관한 것으로, 본 발명에 따른 스퍼터링 장치를 이용하여 유기 박막을 제조하기 위한 방법은, 스퍼터링 장치의 챔버 내부에 타깃 물질을 포함하는 타깃을 배치하고, 타깃과 소정의 거리로 이격시켜 챔버의 내부에 타깃 물질이 증착될 기판을 배치하는 것; 챔버 내부를 진공으로 유지한 후 스퍼터링 가스를 주입하는 것; 및 증착시 타깃 물질의 온도를 200℃ 이하로 유지하기 위해, 적어도 1000가우스 이상의 자기장이 타깃과 기판 사이에 제공되는 동안 타깃에 플라즈마를 발생시킬 수 있는 소정의 전력을 인가하여 기판에 유기 박막을 형성하는 것을 포함함으로써, 유기물의 특성을 손상시키지 않을 수 있다.