NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME

Provided are a nonvolatile memory device with improved product reliability and performance, and a method for manufacturing the same. A nonvolatile memory device includes a conductive plate, a barrier conductive film extended along the surface of the conductive plate, a mold structure including a plu...

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Bibliographic Details
Main Authors JO SANG YOUN, HAN JEE HOON, RYU HYO JOON, KANG SEO GOO, KANAMORI KOHJI
Format Patent
LanguageEnglish
Korean
Published 29.09.2021
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Summary:Provided are a nonvolatile memory device with improved product reliability and performance, and a method for manufacturing the same. A nonvolatile memory device includes a conductive plate, a barrier conductive film extended along the surface of the conductive plate, a mold structure including a plurality of gate electrodes sequentially stacked on a barrier conductive film, a channel hole penetrating through the mold structure to expose the barrier conductive film, an impurity pattern in contact with the barrier conductive film in the channel hole, and a semiconductor pattern extended from the impurity pattern along the side surface of the channel hole and intersecting the plurality of gate electrodes. 제품 신뢰성 및 성능이 향상된 비휘발성 메모리 장치 및 그 제조 방법이 제공된다. 비휘발성 메모리 장치는, 도전 플레이트, 도전 플레이트의 표면을 따라 연장되는 배리어 도전막, 배리어 도전막 상에, 차례로 적층되는 복수의 게이트 전극들을 포함하는 몰드 구조체, 몰드 구조체를 관통하여 배리어 도전막을 노출시키는 채널 홀, 채널 홀 내에, 배리어 도전막과 접촉하는 불순물 패턴, 불순물 패턴으로부터 채널 홀의 측면을 따라 연장되어, 복수의 게이트 전극들과 교차하는 반도체 패턴을 포함한다.
Bibliography:Application Number: KR20200033824