대면적 심리스 마스터 및 임프린트 스탬프 제조 방법

• Main Authors: CUNNINGHAM KEVIN LAUGHTON, CHADHA ARVINDER, THOTHADRI MANIVANNAN
• Format: Patent
• Language: Korean
• Published: 27.09.2021
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

본 개시내용의 실시예들은 일반적으로, 패턴 복제, 임프린트 리소그래피, 그리고 더욱 상세하게는, 심이 없는 대면적 임프린트를 생성하기 위한 방법들 및 장치들에 관한 것이다. 본원에서 개시되는 방법들은 일반적으로, 쌍들의 마스터들 사이의 심들이 복수의 피처들이 상부에 배치되어 있는, 마스터들의 표면과 같은 높이가 되도록, 이러한 심들을 충전제 재료로 충전하는 단계를 포함한다. Embodiments of the present disclosure generally relate to pattern replication, imprint lithography, and more particularly to methods and apparatuses for creating a large area imprint without a seam. Methods disclosed herein generally include filling seams between pairs of masters with a filler material such that the seams are flush with a surface of the masters having a plurality of features disposed thereon.