피막 형성용 조성물, 이 피막 형성용 조성물을 도공하여 이루어지는 유리 기재 및 이 유리 기재를 이용하여 이루어지는 터치 패널

• Main Authors: OKAMOTO KATSUTOSHI, NAKANO TADASHI, IKEDO KEISUKE, MATSUOKA YUTAKA
• Format: Patent
• Language: Korean
• Published: 19.07.2021
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CALCULATING; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPUTING; CORRECTING FLUIDS; COUNTING; DYES; ELECTRIC DIGITAL DATA PROCESSING; ELECTROGRAPHY; FILLING PASTES; GLASS; HOLOGRAPHY; INKS; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; USE OF MATERIALS THEREFOR; WOODSTAINS

본 발명은 보존 동안의 안정성 및 현상성이 우수하고 도공하여 경화 피막을 형성함으로써 투광성 기판이나 전극과의 밀착성 및 투명성이 우수하며 박막에서도 높은 절연성을 갖는 피막 형성용 조성물을 제공하는 것을 목적으로 한다. 본 발명은 하기 조건 1을 만족하는 폴리실록산 화합물, 분자 내에 규소를 포함하지 않는 폴리티올 화합물, 중합 개시제 및 유기 용제를 함유하는 것을 특징으로 하는 피막 형성용 조성물에 관한 것이다. 상기 폴리실록산 화합물을 구성하는 재료로서 테트라알콕시실란 및 비스(트리알콕시실릴)알칸의 군에서 선택되는 적어도 1종인 실란계 화합물(A)과, 알킬트리알콕시실란, 디알킬디알콕시실란, 시클로알킬트리알콕시실란, 비닐트리알콕시실란, 페닐트리알콕시실란의 군에서 선택되는 적어도 1종인 실란계 화합물(B)과, 라디칼 중합성 불포화 이중 결합을 갖는 실란계 화합물(C)을 포함한다. The purpose of the present invention is to provide a film forming composition which has excellent developability and stability during storage, and which, by forming a cured film thereof by coating, has excellent transparency and adhesion to a transparent substrate or an electrode, and has high insulating properties even in a thin film thereof. The present invention relates to a film forming composition characterized by containing a polysiloxane compound satisfying condition 1 below, a polythiol compound not including a silicon atom in the molecule thereof, a polymerization initiator, and an organic solvent. The following are included as materials constituting the polysiloxane compound: a silane-based compound (A) that is at least one compound selected from the group consisting of tetraalkoxysilane and bis(trialkoxysilyl)alkane; a silane-based compound (B) that is at least one compound selected from the group consisting of alkyltrialkoxysilane, dialkyldialkoxysilane, cycloalkyltrialkoxysilane, vinyltrialkoxysilane, and phenyltrialkoxysilane; and a silane-based compound (C) having a radical-polymerizable unsaturated double bond.