PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

• Main Authors: KWON JIN, LEE KYU CHEOL, BAE YOUNGEUN
• Format: Patent
• Language: English; Korean
• Published: 02.07.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A photosensitive resin composition of the present invention introduces a repeating unit represented by a chemical formula 1 and a repeating unit represented by chemical formulas 2 and/or 3 into a binder, and thus, it is possible to manufacture a cured film having excellent resolution by controlling developability while being sufficiently cured even at a low temperature by improving the degree of curing. Furthermore, the composition has chemical resistance, adhesion to a substrate, and stability over time, and thus, it is possible to form the cured film having better physical properties especially at side surfaces. 본 발명의 감광성 수지 조성물은 화학식 1로 표시되는 반복단위와, 화학식 2 및/또는 3으로 표시되는 반복단위를 바인더에 도입함으로써, 경화도를 향상시켜 저온에서도 충분히 경화될 수 있으면서도 현상성을 조절하여 우수한 해상도를 갖는 경화막을 제조할 수 있다. 나아가, 상기 조성물은 내화학성, 기판과의 밀착성 및 경시 안정성 측면에서도 보다 우수한 물성을 갖는 경화막을 형성할 수 있다.