PLASMA PROCESSING DEVICE

• Main Authors: INOUE TADASHI, TSUCHIYA NOBUAKI, SEKIYA KAZUNARI, TAKEDA ATSUSHI, TANABE MASAHARU, SASAMOTO HIROSHI, SATO TATSUNORI, MORIWAKI TAKAYUKI
• Format: Patent
• Language: English; Korean
• Published: 18.05.2021
• Subjects: BASIC ELECTRIC ELEMENTS; BASIC ELECTRONIC CIRCUITRY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS; SEMICONDUCTOR DEVICES

플라스마 처리 장치는, 제1 불평형 단자, 제2 불평형 단자, 제1 평형 단자 및 제2 평형 단자를 갖는 밸룬과, 접지된 진공 용기와, 상기 제1 평형 단자에 전기적으로 접속된 제1 전극과, 상기 제2 평형 단자에 전기적으로 접속된 제2 전극과, 상기 진공 용기 내에 배치되어, 접지된 접지 전극을 구비한다. A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.