STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH STRESSOR

A semiconductor device structure and a method for forming the semiconductor device structure are provided. The semiconductor device structure includes a plurality of semiconductor nanostructures on a substrate and two epitaxial structures on the substrate. Each of the semiconductor nanostructures is...

Full description

Saved in:
Bibliographic Details
Main Authors CHIANG KUO CHENG, JU SHI NING, CHEN GUAN LIN, WANG CHIH HAO
Format Patent
LanguageEnglish
Korean
Published 11.05.2021
Subjects
Online AccessGet full text

Cover

Loading…