STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH STRESSOR
A semiconductor device structure and a method for forming the semiconductor device structure are provided. The semiconductor device structure includes a plurality of semiconductor nanostructures on a substrate and two epitaxial structures on the substrate. Each of the semiconductor nanostructures is...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
11.05.2021
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Subjects | |
Online Access | Get full text |
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