METHOD FOR PREPARING ION EXCHANGE RESIN WITH REDUCED METAL IMPURITY CONTENT

The present invention relates to a method for preparing an ion exchange resin with a reduced metal impurity content, and more particularly, to a method for preparing an ion exchange resin of which the content of metal ions is extremely low and total organic carbon (TOC) elution is low, and has excel...

Full description

Saved in:
Bibliographic Details
Main Authors SHIN DAE CHEOL, CHOI SEUNG MIN, LEE SEUNG YOON, PARK SUK IL, JUNG YOUN SEO, KIM MIN JUNE
Format Patent
LanguageEnglish
Korean
Published 11.05.2021
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The present invention relates to a method for preparing an ion exchange resin with a reduced metal impurity content, and more particularly, to a method for preparing an ion exchange resin of which the content of metal ions is extremely low and total organic carbon (TOC) elution is low, and has excellent resistivity to be used in the manufacture of ultrapure water for semiconductors. The method comprises the following steps of: (1) making an ion exchange resin contact with a mineral acid solution at 30°C or higher; and (2) washing the ion exchange resin obtained in the step (1) with ultrapure water. 본 발명은 금속 불순물 함량이 감소된 이온 교환수지의 제조방법에 관한 것으로, 더욱 상세하게는, 금속 이온의 함유량이 극히 적고 총 유기탄소(TOC) 용출이 낮으며, 비저항 값이 우수하여 반도체용 초순수의 제조에 사용되는 이온 교환수지를 제조하는 방법에 관한 것이다.
Bibliography:Application Number: KR20190136212