APPARATUS FOR GENERATING PLASMA

• Main Author: CHO TAE HYUNG
• Format: Patent
• Language: English; Korean
• Published: 10.05.2021
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS

A plasma generating device according to an embodiment of the present invention comprises: an insulation plate formed with a protrusion; a plasma electrode plate that generates plasma in contact with the insulation plate; and a circuit board that applies a voltage to the plasma electrode plate, wherein the plasma electrode plate comprises a plurality of electrodes spaced apart and disposed from each other, and the circuit board configures a current limiting circuit by connecting a high-voltage resistor in series to each of the plurality of electrodes. Therefore, the present invention is capable of suppressing an occurrence of an electric shock by improving a phenomenon for which a high-voltage is concentrated on a specific surface. 본 발명의 실시 예에 따른 플라즈마 발생 장치는, 돌출부가 형성된 절연판, 절연판에 접하며 플라즈마를 발생시키는 플라즈마 전극판, 플라즈마 전극판으로 전압을 인가하는 회로 기판을 포함하되, 플라즈마 전극판은 서로 이격되어 배치되는 복수의 전극들을 포함하고, 회로 기판은 복수의 전극들 각각에 고전압 저항을 직렬로 연결하여 전류 제한 회로를 구성한다.