다중-유동 전구체 투여를 위한 장치

• Main Authors: MUSTAFA MUHANNAD, RASHEED MUHAMMAD M
• Format: Patent
• Language: Korean
• Published: 23.04.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

유입 단부, 배출 단부, 및 길이를 따라 이격되는 복수의 애퍼쳐들을 갖는 전달 채널을 가진 가스 분배 장치가 제공된다. 전달 채널은 파티션들에 의해 복수의 구역들로 분리된다. 복수의 구역들 각각은 유입구 및 배출구를 갖는다. Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The delivery channel is separated into a plurality of zones by partitions. Each of the plurality of zones has an inlet and an outlet.