Surface modified substrate and Process for producing the same

The present invention relates to a substrate, wherein a part or all of the surface of a substrate including hydrophilic resin particles in a hydrophobic polymer matrix is removed by external energy, and some or all of the hydrophilic resin particles are exposed to add hydrophilic surface properties,...

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Bibliographic Details
Main Authors JEOUNG SAE CHAE, NA DONG YEOP, CHO HAN SAEM
Format Patent
LanguageEnglish
Korean
Published 20.04.2021
Subjects
AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
GENERAL PROCESSES OF COMPOUNDING
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
WORKING-UP
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Summary:The present invention relates to a substrate, wherein a part or all of the surface of a substrate including hydrophilic resin particles in a hydrophobic polymer matrix is removed by external energy, and some or all of the hydrophilic resin particles are exposed to add hydrophilic surface properties, and to a manufacturing method thereof. 본 발명은 소수성 고분자 매트릭스에 친수성 수지 입자가 포함된 기재의 표면의 일부 또는 전체가 외부 에너지에 의하여 제거되어, 상기 친수성 수지 입자의 일부 또는 전체가 노출되어 친수성 표면 특성이 부가되는 기재 및 그 제조방법에 관한 것이다.
Bibliography:Application Number: KR20190125368