A FLOW RATE MEASURING PART OF AMMONIA

• Main Authors: LEE KOO HYUN, CHO HYEONG JUN, HEO WOONG YEOL
• Format: Patent
• Language: English; Korean
• Published: 24.03.2021
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a nitriding furnace system comprising: a nitriding furnace; a storage tank to supply ammonia gas to the nitriding furnace; an electronic flowmeter to measure the flow of supply ammonia gas supplied from the storage tank to the nitriding furnace; an ammonia flow measuring unit to measure the flow of the remaining ammonia gas remaining in the nitriding furnace; and a gas supply line to supply gas of the nitriding furnace from the nitriding furnace to the ammonia flow measuring unit. The nitriding furnace system eliminates expensive nitrogen potential (K_N) measurement equipment, and can control nitrogen potential (K_N) by measuring the flow of ammonia gas in the nitriding furnace in real time. 본 발명은 질화로; 상기 질화로에 암모니아 가스를 공급하기 위한 저장탱크; 상기 저장탱크로부터 상기 질화로에 투입되는, 투입 암모니아 가스의 유량을 측정하기 위한 전자 유량계; 상기 질화로의 내부에 잔존하는, 잔존 암모니아 가스 유량을 측정하기 위한 암모니아 유량측정부; 및 상기 질화로에서 상기 암모니아 유량측정부로 상기 질화로의 가스를 투입하기 위한 가스투입라인을 포함하는 질화로 시스템에 관한 것으로, 고가의 질소포텐셜(KN) 측정장비를 배제하고, 질화로 내의 암모니아 가스의 유량을 실시간으로 측정하여 질소포텐셜(KN)을 제어할 수 있는 질화로 시스템을 제공할 수 있다.