아크 방지 또는 억제를 위한 화학적 기상 증착

• Main Authors: SAKIYAMA YUKINORI, LEESER KARL FREDERICK, BURKHART VINCENT
• Format: Patent
• Language: Korean
• Published: 22.03.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

기판 페데스탈과 기판 사이의 아크를 억제하거나 완전히 제거하는 화학적 기상 증착 (CVD) 툴. CVD 툴은 프로세싱 챔버 내에서 플라즈마에 의해 발생된 것과 동일하거나 실질적으로 동일한 DC 바이어스 전압으로 프로세싱 챔버 내에 제공된 기판 페데스탈을 유지하도록 구성된 직류 (DC) 바이어스 제어 시스템을 포함한다. 기판 페데스탈 및 기판을 플라즈마와 동일한 전위를 갖는 동일하거나 실질적으로 동일한 전압 전위로 유지함으로써, 아크가 억제되거나 완전히 제거된다. A tool that suppresses or altogether eliminates arcing between a substrate pedestal and substrate is disclosed. The tool includes a processing chamber, a substrate pedestal for supporting a substrate within the processing chamber, and shower head positioned within the processing chamber. The shower head is arranged to dispense gas that is turned into a plasma, which develops a DC self-bias potential on the substrate surface. The tool also includes a bias control system configured to induce a DC potential to the substrate at a deliberate target electrical potential.