Far infrared reflective film glass and window including the same and method of preparing the far infrared reflective film

• Main Authors: LEE GWANG HOE, PARK JONG YONG, PARK SEO JIN, EOM SANG YEOL
• Format: Patent
• Language: English; Korean
• Published: 11.03.2021
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS BASED THEREON; DIFFUSION TREATMENT OF METALLIC MATERIAL; DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; FIXED CONSTRUCTIONS; FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES,FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS,BLINDS, GATES; GENERAL PROCESSES OF COMPOUNDING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LADDERS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

Disclosed are a far-infrared reflective film, a glass and window comprising the same, and a method for manufacturing the far-infrared reflective film. The far-infrared reflective film can include: a base layer; a first metal oxide layer including SnO_2_ and ZnO positioned on an upper portion of the base layer; a first SiO_x (here, 1.0<=x<=1.4) interfacial layer positioned on an upper portion of the first metal oxide layer; a first silicon-containing layer located on an upper portion of the first SiO_x interfacial layer; a metal layer located on an upper portion of the first silicon-containing layer; a second silicon-containing layer positioned on an upper portion of the metal layer; a second SiO_x (here, 1.0<=x<=1.4) interfacial layer positioned on an upper portion of the second silicon-containing layer; and a second metal oxide layer including SnO_2 and ZnO positioned on an upper portion of the second SiO_x interface layer. 원적외선 반사필름, 이를 포함하는 유리 및 창, 및 상기 원적외선 반사필름의 제조방법이 개시된다. 상기 원적외선 반사필름은 기재층; 상기 기재층의 상부에 위치한 SnO2및 ZnO을 포함하는 제1 금속산화물층; 상기 제1 금속산화물층의 상부에 위치한 제1 SiOx (여기서, 1.0≤x ≤1.4) 계면층; 상기 제1 SiOx 계면층의 상부에 위치한 제1 실리콘 함유층; 상기 제1 실리콘 함유층의 상부에 위치한 금속층; 상기 금속층의 상부에 위치한 제2 실리콘 함유층; 상기 제2 실리콘 함유층의 상부에 위치한 제2 SiOx (여기서, 1.0≤x ≤1.4) 계면층; 및 상기 제2 SiOx 계면층의 상부에 위치한 SnO2 및 ZnO을 포함하는 제2 금속산화물층;을 포함할 수 있다.