HEATING APPARATUS EVAPORATION SOURCE APPARATUS FILM FORMATION APPARATUS FILM FORMATION METHOD AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

• Main Authors: SUGAWARA YUKI, KAZAMA YOSHIAKI
• Format: Patent
• Language: English; Korean
• Published: 08.12.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Provided is technology for performing preferable film formation by properly heating a deposition material. The heating device for heating a container, wherein the container has an opening through which a deposition material is discharged, a first area, and a second area spaced apart from the opening more than the first area, comprises: a first heater for heating a first area; a second heater for heating a second area; and a control unit for independently controlling each heater. The second heater includes the first and second portions, and the distance between the second portion and the first heater is smaller than the distance between the first portion and the first heater. The control unit integrally controls the first and second portions when controlling the second heater. The heating device further comprises an inner heat reflecting member disposed between the second portion and the container, and shielding heat emitted to the container from the second portion to allow incident energy on an area facing the first portion in the container to be greater than incident energy on an area facing the second portion. [과제] 증착 재료를 양호하게 가열하여 바람직한 성막을 행하기 위한 기술을 제공한다. [해결 수단] 용기를 가열하는 가열 장치로서, 용기는, 증착 재료가 방출되는 개구부와, 제1 영역과, 제1 영역보다 개구부로부터 떨어진 제2 영역을 가지며, 제1 영역을 가열하는 제1 히터와, 제2 영역을 가열하는 제2 히터와, 각 히터를 독립적으로 제어하는 제어부를 가지고 있고, 제2 히터는 제1 부분과 제2 부분을 포함하고, 제2 부분과 제1 히터의 거리는 제1 부분과 제1 히터의 거리보다 작으며, 제어부는, 제2 히터를 제어할 때에, 제1 부분과 제2 부분을 일체로 제어하고, 제2 부분과 용기의 사이에 배치된, 제2 부분으로부터 용기로 방출되는 열을 차폐함으로써, 용기 중 제1 부분에 대향하는 영역에 입사하는 열량을, 제2 부분에 대향하는 영역에 입사하는 열량보다 크게 하는, 내측 열반사 부재를 더 갖는 가열 장치를 이용한다.