HEATING APPARATUS EVAPORATION SOURCE APPARATUS FILM FORMATION APPARATUS FILM FORMATION METHOD AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

• Main Authors: SUGAWARA YUKI, KAZAMA YOSHIAKI
• Format: Patent
• Language: English; Korean
• Published: 08.12.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention provides a technique for performing proper film formation by satisfactorily heating a deposition material. A heating apparatus heats a container for accommodating a deposition material. The container has an opening part to discharge a heated deposition material, a first area, and a second area which is an area separated from the opening part more than the first area. The heating apparatus comprises: a first heater to heat the first area; a second heater to heat the second area; and a control unit to independently control the first heater and the second heater. The second heater includes a first portion and a second portion. The distance between the second portion and the first heater is less than the distance between the first portion and the first heater. The control unit controls the first portion and the second portion as one unit when controlling the second heater. The heat quantity entering the area of the container facing the first portion is greater than the heat quantity entering the area facing the second portion. [과제] 증착 재료를 양호하게 가열하여 바람직한 성막을 행하기 위한 기술을 제공한다. [해결 수단] 증착 재료를 수용하는 용기를 가열하는 가열 장치로서, 용기는, 가열된 증착 재료가 방출되는 개구부와, 제1 영역과, 제1 영역보다 개구부로부터 떨어진 영역인 제2 영역을 가지며, 제1 영역을 가열하는 제1 히터와, 제2 영역을 가열하는 제2 히터와, 제1 히터와 제2 히터를 각각 독립적으로 제어하는 제어부를 가지며, 제2 히터는 제1 부분과 제2 부분을 포함하고, 제2 부분과 제1 히터의 거리는 제1 부분과 제1 히터의 거리보다 작은 것이며, 제어부는, 제2 히터를 제어할 때에, 제1 부분과 제2 부분을 일체로 제어하는 것이며, 용기 중 제1 부분에 대향하는 영역에 입사하는 열량은, 제2 부분에 대향하는 영역에 입사하는 열량보다 큰 가열 장치를 이용한다.