금속 산화물들의 저온 ALD를 위한 방법들

• Main Authors: KALUTARAGE LAKMAL C, SALY MARK, TRINH CONG, BALSEANU MIHAELA, BHUYAN BHASKAR JYOTI
• Format: Patent
• Language: Korean
• Published: 16.11.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

금속 표면들 상에 금속 산화물 층들을 증착시키기 위한 방법들이 설명된다. 방법들은, 금속-산소 결합들을 함유하지 않는 금속 전구체, 및 베타 탄소에 부착된 베타 수소의 산도를 증가시키기 위해 베타 탄소에 대해 위치된 전자 끄는 기를 갖는 개질된 알콜의 개별 용량들에 기판을 노출시키는 단계를 포함한다. 이 방법들은 아래놓인 금속 층을 산화시키지 않으며, 물과 함께 또는 개질된 알콜들 없이 수행되는 프로세스들보다 낮은 온도들에서 수행될 수 있다. Methods for depositing metal oxide layers on metal surfaces are described. The methods include exposing a substrate to separate doses of a metal precursor, which does not contain metal-oxygen bonds, and a modified alcohol with an electron withdrawing group positioned relative to a beta carbon so as to increase the acidity of a beta hydrogen attached to the beta carbon. These methods do not oxidize the underlying metal layer and are able to be performed at lower temperatures than processes performed with water or without modified alcohols.