Semiconductor device and method for manufacturing the same

One objective of the present invention is to improve the field effect mobility in a thin film transistor using an oxide semiconductor. In addition, another objective of the present invention is to suppress the increase in an off current even if the field effect mobility of a thin film transistor is...

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Bibliographic Details
Main Authors AKIMOTO KENGO, SASAKI TOSHINARI
Format Patent
LanguageEnglish
Korean
Published 30.10.2020
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Summary:One objective of the present invention is to improve the field effect mobility in a thin film transistor using an oxide semiconductor. In addition, another objective of the present invention is to suppress the increase in an off current even if the field effect mobility of a thin film transistor is improved. In the thin film transistor using an oxide semiconductor layer, by forming a semiconductor layer having higher electrical conductivity and a smaller thickness than the oxide semiconductor layer between the oxide semiconductor layer and a gate insulating layer, the increase in the off current can be suppressed by improving the field effect mobility of the thin film transistor. 산화물 반도체를 사용한 박막 트랜지스터에 있어서, 전계 효과 이동도를 향상시키는 것을 과제의 하나로 한다. 또한, 박막 트랜지스터의 전계 효과 이동도를 향상시키더라도, 오프 전류의 증대를 억제하는 것을 과제의 하나로 한다. 산화물 반도체층을 사용한 박막 트랜지스터에 있어서, 산화물 반도체층과 게이트 절연층의 사이에, 상기 산화물 반도체층보다 도전율이 높고, 막 두께가 얇은 반도체층을 형성함으로써, 상기 박막 트랜지스터의 전계 효과 이동도를 향상시켜, 또한 오프 전류의 증대를 억제할 수 있다.
Bibliography:Application Number: KR20200137401