감광성 조성물

라디칼 중합성 화합물과, 광라디칼 중합 개시제와, 연쇄 이동제 및 라디칼 트랩제로부터 선택되는 적어도 1종을 포함하는 감광성 조성물에 관한 것이다. Provided is a photosensitive composition including a radically polymerizable compound, a photoradical polymerization initiator, and at least one selected from a chain transfer agent or a radical trapping agent....

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Bibliographic Details
Main Authors NARA YUKI, OKAWARA TAKAHIRO
Format Patent
LanguageKorean
Published 27.10.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:라디칼 중합성 화합물과, 광라디칼 중합 개시제와, 연쇄 이동제 및 라디칼 트랩제로부터 선택되는 적어도 1종을 포함하는 감광성 조성물에 관한 것이다. Provided is a photosensitive composition including a radically polymerizable compound, a photoradical polymerization initiator, and at least one selected from a chain transfer agent or a radical trapping agent.
Bibliography:Application Number: KR20207026832