MONOALKYL TIN TRIALKOXIDES AND/OR MONOALKYL TIN TRIAMIDES WITH LOW METAL CONTAMINATION AND/OR PARTICULATE CONTAMINATION AND CORRESPONDING METHODS

• Main Authors: EDSON JOSEPH B, GATES CRAIG M, CLARK BENJAMIN L, SMIDDY DOMINICK, GENIZA MARK, LAMKIN THOMAS J
• Format: Patent
• Language: English; Korean
• Published: 07.08.2020
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PHYSICS; SEPARATION; TRANSPORTING

Purification of monoalkyl tin trialkoxides and monoalkyl tin triamides using fractional distillation and/or ultrafiltration is disclosed. A purified composition is useful as a radiation sensitive patterning composition or a precursor thereof. A fractional distillation process has been found to be effective in removing metal impurities to very low levels. An ultrafiltration process has been found to be effective in removing fine particulates. A commercially practical processing technique is disclosed. 분별 증류 및/또는 한외 여과를 사용하는 모노알킬 주석 트리알콕사이드 및 모노알킬 주석 트리아미드의 정제가 기술된다. 정제된 조성물은 방사선 감응형 패터닝 조성물 또는 이의 전구체로서 유용하다. 분별 증류 공정은 금속 불순물을 매우 낮은 수준으로 제거하는데 효과적인 것으로 밝혀졌다. 한외 여과 공정은 미세 미립자의 제거에 효과적인 것으로 밝혀졌다. 상업적으로 실용적인 프로세싱 기술이 기술된다.