method for multi-level etch semiconductor sensing device AND METHOD for MANUFACTURING semiconductor sensing device
The present disclosure provides a method for multi-level etching. The method comprises the steps of: providing a substrate; forming a first reference feature over a control region of the substrate; forming an etchable layer over the first reference feature and a target region over the substrate; pat...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
29.07.2020
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Subjects | |
Online Access | Get full text |
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