method for multi-level etch semiconductor sensing device AND METHOD for MANUFACTURING semiconductor sensing device

The present disclosure provides a method for multi-level etching. The method comprises the steps of: providing a substrate; forming a first reference feature over a control region of the substrate; forming an etchable layer over the first reference feature and a target region over the substrate; pat...

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Bibliographic Details
Main Authors LEE CHENG CHE, CHEN LIN CHIEN
Format Patent
LanguageEnglish
Korean
Published 29.07.2020
Subjects
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