PHOTOMASK ASSEMBLY WITH REFLECTIVE PHOTOMASK AND METHOD OF MANUFACTURING A REFLECTIVE PHOTOMASK

• Main Authors: SCHEDEL THORSTEN, BENDER MARKUS, SCHENKE ANDREAS
• Format: Patent
• Language: English; Korean
• Published: 23.07.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A photomask mask assembly (900) includes a reflective photomask (100) and a protective structure (200). The reflective photomask (100) includes a substrate (110) and a reflective multilayer (120) on a first substrate surface (111) of the substrate (110) at the front side of the photomask (100). The protective structure (200) of a second substrate surface (112) of the substrate (110) is detachable from the photomask (100) at a temperature of less than 150°C at the rear side of the photomask (100). According to the present invention, the frequency of occurrence of serious defects on the rear side of a photomask can be reduced or thoroughly alleviated. 포토마스크 마스크 어셈블리(900)는 반사형 포토마스크(100) 및 보호 구조물(200)를 포함한다. 반사형 포토마스크(100)는 기판(110) 및 포토마스크(100)의 전방측에서 기판(110)의 제1 기판 표면(111) 상의 반사형 다층(120)을 포함한다. 기판(110)의 제2 기판 표면(112)의 보호 구조물(200)은 포토마스크(100)의 후방측에서 150 ℃ 미만의 온도에서 포토마스크(100)로부터 분리 가능하다.