POLYMER AND HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS

The present invention relates to a polymer comprising a structural unit represented by chemical formula 1, a hardmask composition containing the polymer; and a method for forming patterns using the hardmask composition. In the chemical formula 1, X^1, Y^1, X^2, Y^2, n1, n2, m1, and m2 are as defined...

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Bibliographic Details
Main Author HEO YUMI
Format Patent
LanguageEnglish
Korean
Published 08.07.2020
Subjects
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:The present invention relates to a polymer comprising a structural unit represented by chemical formula 1, a hardmask composition containing the polymer; and a method for forming patterns using the hardmask composition. In the chemical formula 1, X^1, Y^1, X^2, Y^2, n1, n2, m1, and m2 are as defined in the specification. The present invention can implement a hardmask layer having excellent corrosion resistance. 하기 화학식 1로 표현되는 구조 단위를 포함하는 중합체, 상기 중합체를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용한 패턴 형성 방법에 관한 것이다. [화학식 1]상기 화학식 1에서, X, Y, X, Y, n1, n2, m1 및 m2는 명세서에 정의한 바와 같다.
Bibliography:Application Number: KR20180173105