Substrate treating apparatus
According to an embodiment of the present disclosure, a substrate processing apparatus comprises: a spin chuck for mounting a substrate and rotating the substrate; a chemical solution nozzle for providing a chemical solution on a surface of the substrate; a first laser device emitting first laser li...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
26.06.2020
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Subjects | |
Online Access | Get full text |
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