Susceptor of substrate processing apparatus and substrate processing apparatus

• Main Authors: KIM TAE HOON, LEE YUN GOO, KIM JUNG LAE, JEON YONG BAEK
• Format: Patent
• Language: English; Korean
• Published: 23.06.2020
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a susceptor of a substrate processing apparatus and the substrate processing apparatus, which are capable of lowering the temperature of the edge of a substrate. The present invention includes: a radiating body portion including a first portion corresponding to a central portion of the substrate seated on an upper surface during substrate processing, and a second portion corresponding to the edge portion of the substrate; and an insulating part formed between the first portion and the second portion to prevent heat of the first portion from being transferred to the second portion. 본 발명은 기판의 테두리 부분의 온도를 낮출 수 있는 기판 처리 장치의 서셉터 및 기판 처리 장치에 관한 것으로서, 기판 처리시 상면에 안착되는 기판의 중심 부분과 대응되는 제 1 부분 및 상기 기판의 테두리 부분과 대응되는 제 2 부분을 포함하는 방열 몸체부; 및 상기 제 1 부분의 열이 상기 제 2 부분으로 전달되는 것을 방지할 수 있도록 상기 제 1 부분과 상기 제 2 부분 사이에 형성되는 단열부;를 포함할 수 있다.