DAMPER APPARATUS AND PROCESSING METHOD FOR GAS USING THE SAME

• Main Author: LEE KYUNG KYU
• Format: Patent
• Language: English; Korean
• Published: 05.06.2020
• Subjects: ACTUATING-FLOATS; BLASTING; CHEMISTRY; COCKS; DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE; DEVICES FOR VENTING OR AERATING; ENGINEERING ELEMENTS AND UNITS; FURNACES; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; HEATING; KILNS; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; METALLURGY OF IRON; OVENS; PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL; RETORTS; TAPS; THERMAL INSULATION IN GENERAL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS; VALVES; WEAPONS

The present invention provides a damper apparatus and a gas treatment method using the same. The damper apparatus of the present invention includes: a damper unit disposed inside a duct unit; an operation unit connected to the damper unit and adjusting a position of the damper unit; and a gap inspection unit installed to penetrate the duct unit, and inspecting a flow path gap between the duct unit and the damper unit. The damper apparatus adjusts a flow rate of a gas flowing inside the duct unit. The damper apparatus and the gas treatment method can easily inspect the flow path gap between the damper unit and the duct unit in real time. 본 발명은, 덕트부의 내부에 배치된 댐퍼부, 댐퍼부에 연결되고, 댐퍼부의 위치를 조절하는 작동부, 덕트부를 관통하도록 설치되고, 덕트부와 댐퍼부 사이의 유로 간격을 검사하는 간격 검사부를 포함하고, 덕트부의 내부를 흐르는 가스의 유량을 조절하는 댐퍼 장치 및 이를 이용한 가스 처리 방법으로서, 댐퍼부와 덕트부 사이의 유로 간격을 실시간으로 쉽게 확인할 수 있는 댐퍼 장치 및 가스 처리 방법이 제시된다.