포지티브형 감방사선성 수지 조성물

• Main Author: SAKURAI TAKAAKI
• Format: Patent
• Language: Korean
• Published: 29.05.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

본 발명은, 현상 밀착성이 우수한 패턴을 형성 가능하고, 또한, 저온에서 열처리한 경우라도 내약품성이 우수한 수지막을 형성 가능한 포지티브형 감방사선성 수지 조성물을 제공한다. 본 발명의 포지티브형 감방사선성 수지 조성물은, 알칼리 가용성 수지와, 방사선이 조사되면 카르복실산을 생성하는 제1 산 발생제와, 방사선이 조사되면 술폰산을 생성하는 제2 산 발생제와, 불소 함유 페놀성 화합물을 함유한다. Provided is a positive radiosensitive resin composition which can form patterns having excellent adhesion during development, and which can form resin films having outstanding chemical resistance, even when subjected to heat treatment at low temperatures. This positive radiosensitive resin composition contains: an alkali-soluble resin; a first acid-forming agent which generates carboxylic acid when irradiated with radiation; a second acid-forming agent which generates sulfonic acid when irradiated with radiation; and a fluorine-containing phenolic compound.