ALLOY METAL PLATE AND DEPOSITION MASK INCLUDING THE ALLOY METAL PLATE

• Main Authors: CHANG WOO YOUNG, JUNG HYUN JOON, PARK DUCK HOON
• Format: Patent
• Language: English; Korean
• Published: 28.05.2020
• Subjects: ALLOYS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; ELECTROGRAPHY; FERROUS OR NON-FERROUS ALLOYS; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF ALLOYS OR NON-FERROUS METALS

According to an embodiment of the present invention, the present invention relates to an iron (Fe)-nickel (Ni) alloy metal plate of a deposition mask for OLED pixel deposition. The metal plate is formed by a plurality of crystal grains, and a maximum area of the crystal grains measured in the entire area of the metal plate is 700 um2 or less. According to an embodiment of the present invention, a maximum particle diameter of the crystal grains measured in the entire area of the metal plate is 30 um or less. According to an embodiment of the present invention, the quantity per unit area of the crystal grains is 0.20 to 0.25 ea/μm 2. According to the present invention, the deposition efficiency of a deposition mask can be improved and a deposition defect can be prevented. 실시예에 따른 OLED 화소 증착을 위한 증착용 마스크의 철(Fe)-니켈(Ni) 합금 금속판에 있어서, 상기 금속판은 복수의 결정립들에 의해 형성되고, 상기 금속판의 전체 면적에서 측정되는 결정립들의 최대 면적은 700㎛이하이다. 실시예에 따른 OLED 화소 증착을 위한 증착용 마스크의 철(Fe)-니켈(Ni) 합금 금속판에 있어서, 상기 금속판의 전체 면적에서 측정되는 결정립들의 최대 입경은 30㎛ 이하이다. 실시예에 따른 OLED 화소 증착을 위한 증착용 마스크의 철(Fe)-니켈(Ni) 합금 금속판에 있어서, 상기 복수의 결정립들의 단위 면적당 수량은 0.20ea/㎛내지 0.25ea/㎛이다.