EXPOSURE APPARATUS EXPOSURE METHOD AND METHOD OF MANUFACTURING ARTICLE

The present invention relates to an exposure apparatus which has a simple configuration and is advantageous in reducing a difference in line width of a pattern formed on a substrate. The exposure apparatus for transferring the pattern to the substrate using a light source which emits light comprises...

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Bibliographic Details
Main Authors KAWASHIMA HARUNA, FUKUOKA RYOUSUKE
Format Patent
LanguageEnglish
Korean
Published 10.04.2020
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Summary:The present invention relates to an exposure apparatus which has a simple configuration and is advantageous in reducing a difference in line width of a pattern formed on a substrate. The exposure apparatus for transferring the pattern to the substrate using a light source which emits light comprises: a detection unit detecting each light amount of light in a first wavelength band included in light from a light source and light in a second wavelength band included in the first wavelength band; and a processing unit included in the first wavelength band and acquiring the light amount of light in a third wavelength band different from the second wavelength band based on a detection result of the detection unit. 간이한 구성이고 기판 위에 형성되는 패턴의 선폭의 격차의 저감에 유리한 노광장치를 제공한다. 빛을 출사하는 광원을 사용해서 기판에 패턴을 전사하는 노광장치로서, 광원으로부터의 빛에 포함되는 제1 파장 대역의 빛과, 제1 파장 대역에 포함되는 제2 파장 대역의 빛의 각각의 광량을 검출하는 검출부와, 검출부의 검출 결과에 근거하여, 제1 파장 대역에 포함되고, 제2 파장 대역과는 다른 제3 파장 대역의 빛의 광량을 취득하는 처리부를 구비한다.
Bibliography:Application Number: KR20190113879