광중합체를 위한 보호 층

• Main Authors: HOVESTADT WIELAND, KLOBUTOWSKI THERESE, KOSTROMINE SERGUEI, ROELLE THOMAS, VETTERLE KARL
• Format: Patent
• Language: Korean
• Published: 03.04.2020
• Subjects: CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTROGRAPHY; HOLOGRAPHIC PROCESSES OR APPARATUS; HOLOGRAPHY; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PHOTOGRAPHY; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

본 발명은 광중합체 층 B 및 적어도 부분적으로 경화된 보호 층 C를 포함하는 층 구조, 본 발명에 따른 층 구조의 제조 방법, 부분들의 키트, 광중합체 층 B의 보호를 위한 적어도 부분적으로 경화된 보호 층 C의 용도, 뿐만 아니라 본 발명에 따른 층 구조를 포함하는 광학 디스플레이 및 보안 문서에 관한 것이다. The invention relates to a protective layer comprising a photopolymer layer B and an at least partly cured protective layer C, to a process for producing the layer construction according to the invention, to a kit of parts, to the use of an at least partly cured protective layer C for protection of a photopolymer layer B and to optical displays and security documents comprising the layer construction according to the invention.