RF 스퍼터링 장치를 이용한 유기 박막층 형성 방법 및 상기 RF 스퍼터링 장치, 그리고 상기 RF 스퍼터링 장치에서 사용되는 타겟을 성형하는 장치

• Main Author: SO, MOON SOOK
• Format: Patent
• Language: Korean
• Published: 19.03.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

본 발명은, OLED용 유기 박막층을 형성하는 데에 RF 스퍼터링 장치를 사용한다. 따라서, 본 발명에 따른 RF 스퍼터링 장치를 이용한 OLED용 유기 박막층의 제조 방법은: RF 스퍼터링 장치의 챔버 내부의 캐소드에 OLED 유기 박막층 제조용 타겟을 배치하는 단계; 상기 챔버 내부를 진공으로 유지한 후 반응 가스를 주입하는 단계; 상기 타겟에 자기장 및 RF 전력을 인가하는 단계를 포함한다. Provided is a method for forming a thin film layer of a luminescent organic material for an OLED using an RF sputtering apparatus. The method includes steps of: placing a target comprising a target material for forming a thin film layer of an luminescent organic material for an OLED at a cathode in a chamber of an RF sputtering apparatus and disposing a substrate in which the target material is to be deposited in the chamber; maintaining the chamber in a vacuum state and injecting a reaction gas into the chamber; and applying a minimum RF power and a maximum magnetic field to the target that are sufficient to generate a plasma without damaging the target material.