SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A substrate processing apparatus comprises: a processing module supplying processing gas to a silicon-containing film formed on a surface of a substrate and denaturing the silicon-containing film to produce reaction products; and a flash lamp irradiating light to the reaction products and sublimatin...

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Bibliographic Details
Main Authors HADA KEIKO, SHIMIZU AKITAKA
Format Patent
LanguageEnglish
Korean
Published 17.03.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A substrate processing apparatus comprises: a processing module supplying processing gas to a silicon-containing film formed on a surface of a substrate and denaturing the silicon-containing film to produce reaction products; and a flash lamp irradiating light to the reaction products and sublimating the reaction products. Therefore, the throughput of substrate processing is improved. 기판 처리 장치는, 기판의 표면에 형성된 실리콘 함유막에 처리 가스를 공급하여, 당해 실리콘 함유막을 변질시켜 반응 생성물을 생성하는 처리 모듈과, 상기 반응 생성물에 광을 조사하여, 당해 반응 생성물을 승화시키는 플래시 램프를 갖는다.
Bibliography:Application Number: KR20190104828