SOI METHOD FOR FORMING A SEMICONDUCTOR-ON-INSULATORSOI SUBSTRATE

• Main Authors: LU JIECH FUN, WU CHENG TA, LIU KUAN LIANG, TU YEUR LUEN, CHENG YU HUNG, TSAI CHIA SHIUNG, CHOU SHIH PEI
• Format: Patent
• Language: English; Korean
• Published: 11.03.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Various embodiments of the present intention are to provide a method of forming a semiconductor-on-insulator (SOI) substrate having a thick device layer and a thick insulator layer. In some embodiments, the method includes: a step of forming an insulator layer covering a handle substrate; and a step...