방향성 전자 강판

• Main Authors: TAKAHASHI MASARU, OKUMURA SHUNSUKE, TAKATANI SHINSUKE, NAGANO SHOHJI, MIZUKAMI KAZUMI
• Format: Patent
• Language: Korean
• Published: 02.03.2020
• Subjects: ALLOYS; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; FERROUS OR NON-FERROUS ALLOYS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS; INDUCTANCES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAGNETS; MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS; METALLURGY; METALLURGY OF IRON; MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSFORMERS; TREATMENT OF ALLOYS OR NON-FERROUS METALS

이 방향성 전자 강판은, 모재 강판과, 상기 모재 강판 상에 형성되고, 비정질의 SiO로 이루어지는 산화물 피막과, 상기 산화물 피막 상에 형성된 장력 절연 피막을 구비한다. 모재 강판은, 화학 성분으로서, 질량％로, C: 0.085％ 이하, Si: 0.80 내지 7.00％, Mn: 1.00％ 이하, 산 가용성 Al: 0.065％ 이하, S+0.406·Se로 표시되는 Seq: 0.050％ 이하를 함유하고, 잔부: Fe 및 불가피적 불순물로 이루어진다. X선 회절에 의해 얻어지는 크리스토발라이트형 인산알루미늄의 피크의 반값폭인 FWHM이, (i) Co-Kα 여기원을 사용하였을 때, 2θ＝24.8°에 나타나는 피크의 반값폭(FWHM-Co)이 2.5degree 이하, 또는 (ii) Cu-Kα 여기원을 사용하였을 때, 2θ＝21.3°에 나타나는 피크의 반값폭(FWHM-Cu)이 2.1degree 이하이다. An grain-oriented electrical steel sheet according to the present invention includes: a base steel sheet; an oxide layer that is formed on the base steel sheet and is formed of amorphous SiO2; and a tension-insulation coating that is formed on the oxide layer. The base steel sheet includes, as a chemical composition, by mass%, C: 0.085% or less, Si: 0.80% to 7.00%, Mn: 1.00% or less, acid-soluble Al: 0.065% or less, Seq represented by S+0.406·Se: 0.050% or less, and a remainder consisting of Fe and unavoidable impurities. FWHM that is a half width of a peak of cristobalite type aluminum phosphate obtained by X-ray diffraction satisfies (i) when X-ray diffraction is performed using a Co-Kα excitation source, a half width (FWHM-Co) of a peak appearing at 2θ=24.8° is 2.5 degree or less, or (ii) when X-ray diffraction is performed using a Cu-Kα excitation source, a half width (FWHM-Cu) of a peak appearing at 2θ=21.3° is 2.1 degree or less.