SEMICONDUCTOR RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

• Main Authors: NA YOONG HEE, CHAE SEUNGYONG, CHEON HWANSUNG, KIM JAEHYUN, NAMGUNG RAN, MOON KYUNG SOO
• Format: Patent
• Language: English; Korean
• Published: 19.02.2020
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention relates to a semiconductor resist composition comprising: an organometallic compound containing a structural unit represented by chemical formula 1; and a solvent, and to a pattern forming method using the same. Details of the chemical formula 1 are the same as defined in the specification. 본 기재는, 하기 화학식 1로 표현되는 구조단위를 포함하는 유기금속 화합물 및 용매를 포함하는 반도체 레지스트용 조성물과, 이를 이용한 패턴 형성 방법에 관한 것이다. [화학식 1]화학식 1에 대한 구체적인 내용은 명세서 상에서 정의된 것과 같다.