SEMICONDUCTOR RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
The present invention relates to a semiconductor resist composition comprising: an organometallic compound represented by chemical formula 1; and a solvent, and to a pattern forming method using the same. Details of the chemical formula 1 are the same as defined in the specification. 본 기재는, 하기 화학식 1...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Korean |
Published |
10.02.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a semiconductor resist composition comprising: an organometallic compound represented by chemical formula 1; and a solvent, and to a pattern forming method using the same. Details of the chemical formula 1 are the same as defined in the specification.
본 기재는, 하기 화학식 1로 표현되는 유기금속 화합물 및 용매를 포함하는 반도체 레지스트용 조성물과, 이를 이용한 패턴 형성 방법에 관한 것이다. [화학식 1]화학식 1에 대한 구체적인 내용은 명세서 상에서 정의된 것과 같다. |
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Bibliography: | Application Number: KR20190037135 |