RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

• Main Authors: KOHNO SHINICHI, SHIROKI TAKEAKI, SUNAMICHI TOMONARI, OHNO YOSHIAKI, SAITO AYA
• Format: Patent
• Language: English; Korean
• Published: 21.01.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Provided are a resist composition, which can form a thick film resist film having a film thickness of 5 μm or more, and can form a pattern of a good shape while maintaining high sensitivity, and to a method for forming a resist pattern using the same. The resist composition which generates acid by e...