SUBSTRATE STAGE AND FILM FORMING APPARATUS

• Main Authors: TAKEI JUNICHI, ORIMOTO SHINJI, SUZUKI NAOYUKI, SONE HIROSHI
• Format: Patent
• Language: English; Korean
• Published: 02.01.2020
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention improves load resistance of a substrate placing table, thereby increasing position accuracy of a substrate. According to one embodiment of the present invention, the substrate placing table comprises: a shaft part rotationally arranged with respect to a floor surface of a processing container; a base part provided on the shaft part; and a horizontal moving device attached to the base part and moving a substrate within the processing container in a horizontal direction with respect to the floor surface. 본 발명은 기판 배치대의 내하중성을 향상시켜, 기판의 위치 정밀도를 높일 수 있는 기술을 제공하는 것을 과제로 한다. 본 개시의 일양태에 따른 기판 배치대는, 처리 용기의 바닥면에 대하여 회전 가능하게 배치된 축부와, 상기 축부 상에 마련된 베이스부와, 상기 베이스부에 부착되어, 상기 처리 용기 내에서 기판을 상기 바닥면에 대하여 수평 방향으로 이동시키는 수평 이동 기구를 갖는다.