SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

• Main Authors: ASOU YUTAKA, NAGATA HIROSHI, SADA TETSUYA
• Format: Patent
• Language: English; Korean
• Published: 26.12.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention relates to a technique for improving the uniformity of development. A substrate processing apparatus comprises: a conveying mechanism; a developing solution tank; and a supply nozzle, wherein the conveying mechanism carries out the flat flow conveyance of a substrate with which an exposed photoresist film formed on a surface, and in the developing solution tank, the substrate conveyed by the conveying mechanism is immersed in the developing solution. In addition, the supply nozzle applies the developing solution to the substrate conveyed out from the developing solution in the developing solution tank. [과제] 현상의 균일성을 향상시키는 기술을 제공한다. [해결수단] 실시형태에 따른 기판 처리 장치는, 반송 기구와, 현상액조와, 공급 노즐을 구비한다. 반송 기구는, 노광된 포토 레지스트막이 표면에 형성된 기판을 평류 반송한다. 현상액조는, 반송 기구에 의해 반송되는 기판이 현상액에 침지된다. 공급 노즐은, 현상액조 내의 현상액으로부터 밖으로 반송된 기판에 현상액을 적용한다.