REFLECTIVE MASK BLANK REFLECTIVE MASK AND METHOD OF MANUFACTURING REFLECTIVE MASK BLANK

• Main Author: TANABE HIROYOSHI
• Format: Patent
• Language: English; Korean
• Published: 23.12.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention relates to a reflective mask blank which can suppress defects a surface of an absorber layer by oxidizing the surface of the absorber layer, to a reflective mask blank (10A) comprising: a reflective layer (12) which reflects EUV light on a substrate (11); and an absorption layer (14) which absorbs the EUV light in the order from a substrate side, wherein the absorption layer (14) contains Sn and has a prevention layer (15) which prevents the oxidation of the absorption layer (14) on the absorption layer (14). 흡수층의 표면이 산화하여, 흡수층의 표면에 결함이 발생하는 것을 억제할 수 있는 반사형 마스크 블랭크를 제공한다. 반사형 마스크 블랭크(10A)는 기판(11) 상에 EUV광을 반사하는 반사층(12)과, EUV광을 흡수하는 흡수층(14)을 기판측으로부터 이 순서대로 갖는 반사형 마스크 블랭크이며, 흡수층(14)은 Sn을 함유하고, 흡수층(14) 상에 흡수층(14)의 산화를 방지하는 방지층(15)을 갖는다.