SILANE COMPOUND INSULATION LAYER ETCHANT COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME

• Main Authors: BAEK JONG WOOK, LEE SEUNG YONG, KIM BYOUNG MOOK, CHOI HAN YOUNG, KIM KYONG CHEOL, KANG HEE GEUN, HAN GEUN HEE, JUNG YOON SUNG, KIM TAEK SOO, KIM SANG TAE, CHOI KYEONG MUK, PARK YOUNG CHUL
• Format: Patent
• Language: English; Korean
• Published: 13.11.2019
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; PAINTS; POLISHES; SEMICONDUCTOR DEVICES

Embodiments of the present invention provide a silane compound having a specific structure, an etchant composition comprising the same, and a pattern forming method using the same. The silane compound having the specific structure according to embodiments of the present invention can contain a water-soluble group to suppress gelation or aggregation when added to an aqueous solution. 본 발명의 실시예들은 특정 화학구조의 실란 화합물, 이를 포함하는 식각액 조성물 및 이를 이용한 패턴 형성 방법을 제공한다. 본 발명의 실시예들에 따른 특정 구조의 실란 화합물은 수용성기를 포함하여 수용액에 투입 시 겔 화 또는 응집 현상이 억제될 수 있다.