네거티브형 감광성 수지 조성물

본 발명의 네거티브형 감광성 수지 조성물은, 알칼리 가용성 수지와, 비이온성 광산 발생제와, 증감제를 포함한다. A negative photosensitive resin composition contains an alkali-soluble resin, a non-ionic photoacid generator, and a sensitizer.

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Bibliographic Details
Main Author SAKURAI TAKAAKI
Format Patent
LanguageKorean
Published 14.10.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:본 발명의 네거티브형 감광성 수지 조성물은, 알칼리 가용성 수지와, 비이온성 광산 발생제와, 증감제를 포함한다. A negative photosensitive resin composition contains an alkali-soluble resin, a non-ionic photoacid generator, and a sensitizer.
Bibliography:Application Number: KR20197023354