COMPOSITION FOR SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCESS

• Main Authors: KIM BYOUNGSOO, JIN GYU AN, OH JUN ROK
• Format: Patent
• Language: English; Korean
• Published: 18.09.2019
• Subjects: ADHESIVES; ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; DETERGENT COMPOSITIONS; DETERGENTS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FATTY ACIDS THEREFROM; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

The present invention relates to a composition for a semiconductor process, which comprises: a first component including an inorganic acid or an organic acid; and a second component including a silicone compound represented by chemical formula 1, and provides a wafer showing excellent surface properties, and to a semiconductor process which comprises the steps of: selectively washing organic or inorganic materials using the same; or removing the same. 무기산 또는 유기산을 포함하는 제1 성분; 및 화학식 1로 표시되는 실리콘 화합물을 포함하는 제2 성분을 포함하는 반도체 공정용 조성물과 이를 이용하여 유기물 또는 무기물을 선택적으로 세정하는 단계; 또는 제거하는 단계;를 포함하는 반도체 공정을 제공한다.