METHODS FOR REMOVING METAL OXIDES

Provided are methods for removing metal oxides from substrate surfaces. According to some embodiments of the present disclosure, an aqueous alkaline solution is utilized to remove metal oxides from the substrate surfaces using a wet method. Some embodiments of the present disclosure are performed at...

Full description

Saved in:
Bibliographic Details
Main Authors MULLICK AMRITA B, FREED REGINA, MITRA UDAY
Format Patent
LanguageEnglish
Korean
Published 11.09.2019
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Provided are methods for removing metal oxides from substrate surfaces. According to some embodiments of the present disclosure, an aqueous alkaline solution is utilized to remove metal oxides from the substrate surfaces using a wet method. Some embodiments of the present disclosure are performed at atmospheric pressure and lower temperatures. Methods of forming self-assembly vias are also described. 기판 표면들로부터 금속 산화물들을 제거하는 방법들이 설명된다. 본 개시내용의 일부 실시예들은, 습식 방법을 사용하여 기판 표면들로부터 금속 산화물들을 제거하기 위해 수성 알칼리 용액을 활용한다. 본 개시내용의 일부 실시예들은 대기압 및 더 낮은 온도들에서 수행된다. 자기 정렬식 비아들을 형성하는 방법들이 또한 설명된다.
Bibliography:Application Number: KR20190023208